Optical and X-Ray Characterization

Optical and X-Ray Characterization

本课程是 Semiconductor Characterization 专项课程的一部分

位教师：Trevor Thornton

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6个模块

深入了解一个主题并学习基础知识。

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6个模块

深入了解一个主题并学习基础知识。

30 条评论

中级等级

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4 小时完成

灵活的计划

自行安排学习进度

您将学到什么

Describe the use of light to measure the thickness and refractive index of thin transparent films.
Explain how light is absorbed and emitted by semiconductors.
Explain the advantages and limitations of optical and X-ray characterization.

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作业

5 项作业

授课语言：英语（English）

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该课程共有6个模块

Optical and X-ray techniques are powerful ways to characterize semiconductor thin films. They can be used to measure film thickness, purity and crystalline quality, and for compositional analysis. Modern techniques are fast, turn-key, and generally non-destructive, allowing for rapid assessment of material properties. This course describes the fundamentals of optical and X-ray characterization and provides real-world examples of how they are used in semiconductor manufacturing.

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1个视频2篇阅读材料

This week introduces the concept of reflectance spectroscopy: a rapid, convenient, and non-destructive technique for measuring the thickness of transparent materials.

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2个视频1篇阅读材料1个作业

This week, you will learn about ellipsometry, a powerful technique that allows us to extract the thickness and refractive index of transparent layers as thin as a few nanometers.

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1个视频1篇阅读材料1个作业

This week, you will learn about photoluminescence.

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1个视频1篇阅读材料1个作业

This week, you will learn about electron microprobe X-ray analysis.

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2个视频1个作业

This week, you will complete a case study to assess your ability to analyze electron microprobe x-ray images to determine the constituent elements in a 40 nm MOSFET.